Brief Introduction of Customizable pulsed laser sputtering deposition system:
Pulsed laser deposition system, abbreviated as PLD system, this system consists of two parts: excimer laser and vacuum coating chamber; vacuum coating chamber consists of a sputtering vacuum chamber, a rotating target stage, an anti-oxidation substrate heating stage, a working gas path, gas extraction system, installation machine table, vacuum measurement and electrical control system.

Equipment composition of Customizable pulsed laser sputtering deposition system:
1. Laser
Based on LightMachinery's best-selling IPEX series of industrial-grade excimer lasers, the laser is optimized for PLD applications; the IPEX series excimer lasers exhibit excellent performance, durability, reliability, and easy integration performance to meet the requirements of researchers and system integrators in the field of pulsed laser deposition (PLD).
1) Laser advantages
(1) GasMiser-1000 option works with ICON technology to extend gas life and reduce operating costs
(2) Excellent spot uniformity and energy stability between pulses, short pulse width
(3) Energy remains constant at all repetition frequencies
(4) EasyClean automatic sealing feature keeps gas filled and reduces maintenance downtime
(5) Highly stable optical mount for excellent beam pointing accuracy
(6) Customizable beam delivery system to suit specific PLD application needs
2) PLD stable performance
Constant pulse energy: The IPEX-740 / 760 series excimer lasers combining ICON and GasMiser-1000 technologies have unparalleled dynamic and static gas life after a single gas exchange. From the single to the maximum repetition frequency, the pulse energy is constant at all repetition frequencies. This method guarantees that the PLD process parameters will not change with the change of laser working time and repetition frequency.
Constant pulse stability: The advanced energy monitoring method is used to adjust the pulse energy, which can accurately adjust the discharge voltage and the mixed gas, and maintain a constant output energy under all working conditions (including Burst mode). Pulse-to-pulse stability is better than 1%.
Constant pointing stability: High-stability core optics bracket, providing pointing stability superior to 200μrad, ensuring that no recalibration is required after optical repair.
Constant beam quality: The beam intensity distribution of the IPEX-740 / 760 series lasers is designed to have a sharp edge and a flat top, especially has minimal change within the working life of the laser chamber.
3) Laser specifications
Wavelength(nm) 193 (ArF) 248 (KrF) 308(XeCl)
Stabilised Pulse Energy(mJ) at all repetition rates IPEX-740 Series 150 400 250
IPEX-760 Series 200 600 500
Maximum Pulse Energy(mJ) at low repetition rates IPEX-740 Series 230 450 300
IPEX-760 Series 250 700 600
Stabilised Average Power(W) IPEX-746 15 40 25
IPEX-744 6.0 20 12
IPEX-742 3.0 10 6.0
IPEX-766 10 30 25
IPEX-764 5.0 18 10
IPEX-762 2.5 9.0 5.0
Maximum Repetition Rate (pps) IPEX-746 100 100 100
IPEX-744 40 50 50
IPEX-742 20 25 25
IPEX-766 40 50 40
IPEX-764 25 30 20
IPEX-762 12 15 10
Pulse Duration(ns)
(FWHM,nominal) IPEX-740/760 Series 12 - 20
Beam Dimensions(mm)
(V×H,nominal) IPEX-740 Series 12 × 26
IPEX-760 Series 12 × 28
Beam Divergence(mrad)
(V×H,nominal) IPEX-740/760 S