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29 products
44156
Zhengzhou CY Technology Instrument Co., Ltd.
Fully Automatic Production Type Single Cavity Atomic Layer Deposition System
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44157
Zhengzhou CY Technology Instrument Co., Ltd.
ALD Atomic Layer Deposition System for deposition of Single substance, nitride, oxide, other compound film
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44158
Zhengzhou CY Technology Instrument Co., Ltd.
Plasma Enhance Atomic Layer Deposition System (PEALD) Single-Wafer Deposition System
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44159
Zhengzhou CY Technology Instrument Co., Ltd.
Plasma Enhance Atomic Layer Deposition System (PEALD) Single-Wafer Deposition System
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44160
Zhengzhou CY Technology Instrument Co., Ltd.
Multi-Piece Plasma Enhanced Atomic Layer Deposition System for The Deposition of Thin Films of Temperature-Sensitive Materials
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44161
Zhengzhou CY Technology Instrument Co., Ltd.
Thermal Atomic Layer Single-Wafer Deposition System for Micro-Electronic, Nano Material, Optical Film, Solar Battery
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44162
Zhengzhou CY Technology Instrument Co., Ltd.
Heating (T-ALD) Atomic Layer Deposition System Tald Thermal Atomic Layer Deposition System
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44163
Zhengzhou CY Technology Instrument Co., Ltd.
Single Chamber Type Atomic Layer Deposition System (ALD) for The Preparation of Conventional Oxide Films
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44164
Zhengzhou CY Technology Instrument Co., Ltd.
Atomic Layer Deposition System (ALD) with Double Cavity for Solar Cells, Optical Films, Nano Films
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44165
Zhengzhou CY Technology Instrument Co., Ltd.
500W Plasma Atomic Layer System Used in Thin Film Semiconductor Material Preparation System
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44166
Zhengzhou CY Technology Instrument Co., Ltd.
PEALD plasma enhanced atomic layer deposition system with 316 stainless steel cavity
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44167
Zhengzhou CY Technology Instrument Co., Ltd.
Vacuum Plasma Atomic Layer Deposition System with high control accuracy
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